Advanced Biomaterials and Devices in Medicine
June 2015, Volume 2, Issue 1, pp 37–43

Kinetics of Ag+ ion release from TiCaPCON-Ag films: Influence of Ag content and surface roughness

I.V. Sukhorukova*, A.N. Sheveyko, Ph.V. Kiryukhantsev-Korneev, D.V. Shtansky

National University of Science and Technology (MISiS), Moscow, 119049 Russia

* Corresponding author: Irina V. Sukhorukova, e-mail: irina_btnn@mail.ru

Abstract
TiCaPCON-Ag films with 1.0 and 2.5 at % Ag were deposited by magnetron sputtering onto Ti substrates with different surface roughness, i.e. (i) polished Ti with average surface roughness Ra = 20 nm and (ii) pulsed electrospark treated Ti with Ra = 8 m. Doping with Ag was found to result in the formation of Ag nanoparticles, 5–10 nm in size, located on the film surface. The kinetics of Ag+ ion release from the films into physiological solution was studied by inductively coupled plasma mass spectrometry. It has been demonstrated that the process of Ag+ ion leaching out of the surface can be well controlled by varying the substrate surface roughness and the Ag content of the films.

Keywords: magnetron sputtering, TiCaPCON-Ag films, structure, surface roughness, electrochemical study, Ag+ ion release